Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Chung-Te Lin0
Jyu-Horng Shieh0
Pin-Ren Dai0
Han-Ting Tsai0
Hui-Hsien Wei0
Wei-Chih Wen0
Chien-Min Lee0
Tai-Yen Peng0
Date of Patent
October 22, 2024
0Patent Application Number
181709470
Date Filed
February 17, 2023
0Patent Citations
...
Patent Primary Examiner
Patent abstract
An IC structure comprises a substrate, a first dielectric structure, a second dielectric structure, a first via structure, and a memory cell structure. The substrate comprises a memory region and a logic region. The first dielectric structure is over the memory region. The second dielectric structure laterally extends from the first dielectric structure to over the logic region. The second dielectric structure has a thickness less than a thickness of the first dielectric structure. The first via structure extends through the first dielectric structure. A top segment of the first via structure is higher than a top surface of the first dielectric structure. The first memory cell structure is over the first via structure.
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