Is a
Patent attributes
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Ann Erickson0
Darrell Ehrlich0
Date of Patent
October 29, 2024
0Patent Application Number
174353400
Date Filed
March 4, 2020
0Patent Citations
Patent Primary Examiner
CPC Code
Patent abstract
An electrostatic chuck system for a plasma processing chamber is provided. A base plate comprising Al—SiC is provided. A ceramic plate is disposed over the base plate. A bonding layer bonds the ceramic plate to the base plate.
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.
