US Patent 7129010 Substrates for in particular microlithography
Patent 7129010 was granted and assigned to Schott AG on October, 2006 by the United States Patent and Trademark Office.
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Patent Inventor Names
Hrabanus Hack0
Jochen Alkemper0
Lutz Aschke0
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Patent abstract
The present invention relates to a substrate in particular of EUV microlithography, to the production of a substrate of this type and to the use of this substrate as a substrate for mirrors and/or masks or mask blanks in particular in EUV microlithography.
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US Patent 07129010 Substrates for in particular microlithography US Patent 7129010 Substrates for in particular microlithography
Infobox
Patent Number
071290100
Patent Number
71290100
Edits on 28 Mar, 2023
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Infobox
Is a
Current Assignee
Patent Jurisdiction
Patent Number
071290100
Date of Patent
October 31, 2006
0Patent Application Number
106280590
Date Filed
July 25, 2003
0Official Website
Patent Primary Examiner
Edits on 19 May, 2022
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US Patent 07129010 Substrates for in particular microlithography
Infobox
Is a
Current assignee
Patent jurisdiction
Patent number
07129010
Date of patent
October 31, 2006
Patent application number
10628059
Date Filed
July 25, 2003
Patent primary examiner
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