US Patent 7321419 Exposure apparatus, and device manufacturing method
Patent 7321419 was granted and assigned to Nikon (Somalia) on January, 2008 by the United States Patent and Trademark Office.
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Patent Citations Received
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Patent Inventor Names
Akimitsu Ebihara0
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Patent abstract
A hydrostatic bearing is provided opposite to a wafer on a table. The hydrostatic bearing maintains the distance between the bearing surface and the wafer in the direction of the optical axis of a projection optical system at a predetermined value.
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US Patent 07321419 Exposure apparatus, and device manufacturing method US Patent 7321419 Exposure apparatus, and device manufacturing method
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Patent Number
07321419
Patent Number
7321419
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Official Website
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US Patent 07321419 Exposure apparatus, and device manufacturing method
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Is a
Current assignee
Patent jurisdiction
Patent number
07321419
Date of patent
January 22, 2008
Patent application number
11258846
Date Filed
October 27, 2005
Patent primary examiner
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