Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Mark Wilcoxson0
Seokmin Yun0
John M. Boyd0
John deLarios0
Date of Patent
February 12, 2008
0Patent Application Number
110619440
Date Filed
February 17, 2005
0Patent Primary Examiner
Patent abstract
A method for removing post-processing residues in a single wafer cleaning system is provided. The method initiates with providing a first heated fluid to a proximity head disposed over a substrate. Then, a meniscus of the first fluid is generated between a surface of the substrate and an opposing surface of the proximity head. The substrate is linearly moved under the proximity head. A single wafer cleaning system is also provided.
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