Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Harry Sewelll0
Date of Patent
February 19, 2008
0Patent Application Number
110125980
Date Filed
December 16, 2004
0Patent Primary Examiner
Patent abstract
Provided is a method and system for imprinting a pattern formed on a surface of an imprint mask into a substrate. A method includes deforming at least one of the surface of the imprint mask and a surface of the substrate to produce a deformed surface having an arc therein. A clamping pressure is applied to bring the deformed surface into intimate contact with the other surface, the applied pressure substantially flattening the deformed surface. The applied clamping pressure is released to separate the two surfaces.
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