US Patent 7331283 Method and apparatus for imprint pattern replication

Patent 7331283 was granted and assigned to ASML Holding on February, 2008 by the United States Patent and Trademark Office.

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Patent Inventor Names

Harry Sewelll0

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Patent abstract

Provided is a method and system for imprinting a pattern formed on a surface of an imprint mask into a substrate. A method includes deforming at least one of the surface of the imprint mask and a surface of the substrate to produce a deformed surface having an arc therein. A clamping pressure is applied to bring the deformed surface into intimate contact with the other surface, the applied pressure substantially flattening the deformed surface. The applied clamping pressure is released to separate the two surfaces.

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Official Website

https://pdfpiw.uspto.gov/.piw?Docid=073312830

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