Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Robert David Allen0
Linda Karin Sundberg0
Ratnam Sooriyakumaran0
Date of Patent
July 15, 2008
0Patent Application Number
110648710
Date Filed
February 24, 2005
0Patent Citations Received
Patent Primary Examiner
Patent abstract
A composition that includes functionalized polyhedral oligomeric silsesquioxanes derivatives of the formulas TmR3 where m is equal to 8, 10 or 12 and QnMnR1,R2,R3 where n is equal to 8, 10 or 12 are provided. The functional groups include aqueous base soluble moieties. Mixtures of the functionalized polyhedral oligomeric silsesquioxanes derivatives are highly suitable as a topcoat for photoresist in photolithography and immersion photolithography applications.
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.
