US Patent 7399581 Photoresist topcoat for a photolithographic process
Is a
Date Filed
February 24, 2005
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Date of Patent
July 15, 2008
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Patent Application Number
11064871
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Patent Citations Received
Patent Inventor Names
Robert David Allen
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Linda Karin Sundberg
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Ratnam Sooriyakumaran
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Patent Jurisdiction
Patent Number
Patent Primary Examiner
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