US Patent 7451774 Method and apparatus for wafer cleaning
Patent 7451774 was granted and assigned to Applied Materials on November, 2008 by the United States Patent and Trademark Office.
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Patent abstract
An apparatus for wet processing individual wafers comprising; a means for holding the wafer; a means for providing acoustic energy to a non-device side of the wafer; and a means for flowing a fluid onto a device side of the wafer.
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US Patent 07451774 Method and apparatus for wafer cleaning US Patent 7451774 Method and apparatus for wafer cleaning
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Patent Number
0745177400
Patent Number
745177400
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Official Website
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Infobox
Is a
Current Assignee
Patent Jurisdiction
Patent Number
074517740
Date of Patent
November 18, 2008
0Patent Application Number
098918490
Date Filed
June 25, 2001
0Official Website
Patent Primary Examiner
Edits on 26 Sep, 2022
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Infobox
Is a
Current Assignee
Patent Jurisdiction
Patent Number
074517740
Date of Patent
November 18, 2008
0Patent Application Number
098918490
Date Filed
June 25, 2001
0Official Website
Patent Primary Examiner
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US Patent 07451774 Method and apparatus for wafer cleaning
Infobox
Is a
Current assignee
Patent jurisdiction
Patent number
07451774
Date of patent
November 18, 2008
Patent application number
09891849
Date Filed
June 25, 2001
Patent primary examiner
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