US Patent 7451774 Method and apparatus for wafer cleaning
Patent 7451774 was granted and assigned to Applied Materials on November, 2008 by the United States Patent and Trademark Office.
Is a
Current Assignee
Date Filed
June 25, 2001
Date of Patent
November 18, 2008
Patent Application Number
09891849
Patent Jurisdiction
Patent Number
Patent Primary Examiner
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