US Patent 7557363 Closed loop dose control for ion implantation

Patent 7557363 was granted and assigned to Axcelis Technologies on July, 2009 by the United States Patent and Trademark Office.

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Patent Inventor Names

Brian S. Freer0

Christopher Godfrey0

John Ye0

Michael A. Graf0

Patrick Splinter0

Yongzhang Huang0

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Patent abstract

A method derives a terminal return current or upstream current to adjust and/or compensate for variations in beam current during ion implantation. One or more individual upstream current measurements are obtained from a region of an ion implantation system. A terminal return current, or composite upstream current, is derived from the one or more current measurements. The terminal return current is then employed to adjust scanning or dose of an ion beam in order to facilitate beam current uniformity at a target wafer.

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Official Website

https://pdfpiw.uspto.gov/.piw?Docid=075573630

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