Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Craig B. Hickson0
Timothy J. Provencher0
Date of Patent
April 5, 2011
0Patent Application Number
116543720
Date Filed
January 17, 2007
0Patent Citations Received
Patent Primary Examiner
Patent abstract
A system and method for distributing one or more gases to an atomic layer deposition (ALD) reactor. An integrated inlet manifold block mounted over a showerhead assembly includes high temperature (up to 200° C.) rated valves mounted directly thereto, and short, easily purged reactant lines. Integral passageways and metal seals avoid o-rings and attendant dead zones along flow paths. The manifold includes an internal inert gas channel for purging reactant lines within the block inlet manifold
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.