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US Patent 7918938 High temperature ALD inlet manifold
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Patent
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Date Filed
January 17, 2007
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Date of Patent
April 5, 2011
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Patent Application Number
11654372
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Patent Citations Received
US Patent 11830731 Semiconductor deposition reactor manifolds
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Patent Inventor Names
Craig B. Hickson
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Timothy J. Provencher
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Patent Jurisdiction
United States Patent and Trademark Office
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Patent Number
7918938
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Patent Primary Examiner
Jeffrie R. Lund
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