Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Yukio Nishimura0
Ratnam Sooriyakumaran0
Robert Allen0
Shiro Kusumoto0
Daniel P. Sanders0
Gregory M. Wallraff0
Hoa Trung0
Linda K. Sundberg0
...
Date of Patent
May 31, 2011
0Patent Application Number
120231080
Date Filed
January 31, 2008
0Patent Primary Examiner
Patent abstract
Photoresist additive polymers and photoresist formulations that can be used in immersion lithography without the use of an additional topcoat. The resist compositions include a photoresist polymer, at least one photoacid generator, a solvent; and a photoresist additive polymer. Also a method of forming using photoresist formulations including photoresist additive polymers.
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