US Patent 7951524 Self-topcoating photoresist for photolithography
Is a
Date Filed
January 31, 2008
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Date of Patent
May 31, 2011
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Patent Application Number
12023108
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Patent Inventor Names
Yukio Nishimura
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Ratnam Sooriyakumaran
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Robert Allen
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Shiro Kusumoto
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Daniel P. Sanders
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Gregory M. Wallraff
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Hoa Trung
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Linda K. Sundberg
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Mark Steven Slezak
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Phillip Brock
0
Patent Jurisdiction
Patent Number
Patent Primary Examiner
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