US Patent 7951524 Self-topcoating photoresist for photolithography
All edits
Edits on 28 Nov, 2023
Golden AI
Edits made to:
Article (+390 characters)
Article
Patent abstract
Photoresist additive polymers and photoresist formulations that can be used in immersion lithography without the use of an additional topcoat. The resist compositions include a photoresist polymer, at least one photoacid generator, a solvent; and a photoresist additive polymer. Also a method of forming using photoresist formulations including photoresist additive polymers.
Edits on 19 Sep, 2023
Golden AI
Edits made to:
Infobox (+10 properties)
Infobox
Patent Inventor Names
Daniel P. Sanders0
Gregory M. Wallraff0
Hoa Trung0
Linda K. Sundberg0
Mark Steven Slezak0
Phillip Brock0
Ratnam Sooriyakumaran0
Robert Allen0
Shiro Kusumoto0
Yukio Nishimura0
Edits on 20 May, 2023
Golden AI
Edits made to:
Infobox (+1/-1 properties)
US Patent 07951524 Self-topcoating photoresist for photolithography US Patent 7951524 Self-topcoating photoresist for photolithography
Infobox
Patent Number
079515240
Patent Number
79515240
Edits on 24 Apr, 2023
Golden AI
Infobox
Is a
Patent Jurisdiction
Patent Number
079515240
Date of Patent
May 31, 2011
0Patent Application Number
120231080
Date Filed
January 31, 2008
0Patent Primary Examiner
Edits on 7 Dec, 2021
Golden AI
Edits made to:
Infobox (+7 properties)
US Patent 07951524 Self-topcoating photoresist for photolithography
Infobox
Is a
Patent jurisdiction
Patent number
07951524
Date of patent
May 31, 2011
Patent application number
12023108
Date Filed
January 31, 2008
Patent primary examiner
Find more entities like US Patent 7951524 Self-topcoating photoresist for photolithography
Use the Golden Query Tool to find similar entities by any field in the Knowledge Graph, including industry, location, and more.
