Is a
Patent attributes
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Ofer Sneh0
Date of Patent
September 6, 2011
0Patent Application Number
126137220
Date Filed
November 6, 2009
0Patent Citations Received
Patent Primary Examiner
Patent abstract
An apparatus and method for atomic layer deposition with improved efficiency of both chemical dose and purge is presented. The apparatus includes an integrated equipment and procedure for chamber maintenance.
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.