US Patent 8012261 ALD apparatus and method
Patent 8012261 was granted and assigned to Sundew Technologies on September, 2011 by the United States Patent and Trademark Office.
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Patent abstract
An apparatus and method for atomic layer deposition with improved efficiency of both chemical dose and purge is presented. The apparatus includes an integrated equipment and procedure for chamber maintenance.
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Patent Inventor Names
Ofer Sneh0
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US Patent 08012261 ALD apparatus and method US Patent 8012261 ALD apparatus and method
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Patent Number
080122610
Patent Number
80122610
Edits on 23 Sep, 2022
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Is a
Current Assignee
Patent Jurisdiction
Patent Number
080122610
Date of Patent
September 6, 2011
0Patent Application Number
126137220
Date Filed
November 6, 2009
0Patent Primary Examiner
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US Patent 08012261 ALD apparatus and method
Infobox
Is a
Current assignee
Patent jurisdiction
Patent number
08012261
Date of patent
September 6, 2011
Patent application number
12613722
Date Filed
November 6, 2009
Patent primary examiner
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