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US Patent 8318584 Oxide-rich liner layer for flowable CVD gapfill

Patent 8318584 was granted and assigned to Applied Materials on November, 2012 by the United States Patent and Trademark Office.

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Is a

Patent

Patent attributes

Current Assignee

Applied Materials

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

8318584

Patent Inventor Names

Nitin K. Ingle0

DongQing Li0

Jingmei Liang0

Date of Patent

November 27, 2012

Patent Application Number

13153016

Date Filed

June 3, 2011

Patent Citations Received

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US Patent 12094709 Plasma treatment process to densify oxide layers

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US Patent 11705337 Tungsten defluorination by high pressure treatment

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US Patent 11749555 Semiconductor processing system

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US Patent 11756786 Forming high carbon content flowable dielectric film with low processing damage

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US Patent 11756803 Gas delivery system for high pressure processing chamber

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US Patent 11780859 Halogen free syntheses of aminosilanes by catalytic dehydrogenative coupling

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US Patent 11881411 High pressure annealing process for metal containing materials

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US Patent 11694912 High pressure and high temperature anneal chamber

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Patent Primary Examiner

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Julio J Maldonado

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