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US Patent 8318584 Oxide-rich liner layer for flowable CVD gapfill

Patent 8318584 was granted and assigned to Applied Materials on November, 2012 by the United States Patent and Trademark Office.

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US Patent 12094709 Plasma treatment process to densify oxide layers
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US Patent 11881411 High pressure annealing process for metal containing materials
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US Patent 11780859 Halogen free syntheses of aminosilanes by catalytic dehydrogenative coupling
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DongQing Li0
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Nitin K. Ingle0
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US Patent 11756803 Gas delivery system for high pressure processing chamber
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US Patent 11749555 Semiconductor processing system
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US Patent 11705337 Tungsten defluorination by high pressure treatment
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US Patent 11699584 Si-containing film forming precursors and methods of using the same
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US Patent 11694912 High pressure and high temperature anneal chamber
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US Patent 08318584 Oxide-rich liner layer for flowable CVD gapfill US Patent 8318584 Oxide-rich liner layer for flowable CVD gapfill

Infobox
Patent Number
08318584
Patent Number
8318584
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 US Patent 08318584 Oxide-rich liner layer for flowable CVD gapfill

Infobox
Is a
Patent
Patent
Current assignee
Applied Materials
Applied Materials
Patent jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent number
08318584
Date of patent
November 27, 2012
Patent application number
13153016
Date Filed
June 3, 2011
Patent primary examiner
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Julio J Maldonado

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