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US Patent 8706442 Alignment system, lithographic system and method

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
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Date Filed
July 3, 2009
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Date of Patent
April 22, 2014
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Patent Application Number
13000443
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Patent Citations Received
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US Patent 12135505 Spectrometric metrology systems based on multimode interference and lithographic apparatus
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US Patent 11774863 Induced displacements for improved overlay error metrology
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US Patent 11789368 Lithographic apparatus, metrology system, and illumination systems with structured illumination
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US Patent 11966169 Lithographic apparatus, metrology systems, phased array illumination sources and methods thereof
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US Patent 11971665 Wafer alignment using form birefringence of targets or product
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US Patent 11994808 Lithographic apparatus, metrology systems, phased array illumination sources and methods thereof
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US Patent 12124173 Lithographic apparatus, metrology systems, illumination sources and methods thereof
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Patent Inventor Names
Maurits Van Der Schaar
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Henricus Johannes Lambertus Megens
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Hubertus Johannes Gertrudus Simons
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Scott Anderson Middlebrooks
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Everhardus Cornelis Mos
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
8706442
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Patent Primary Examiner
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John E Breene
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