Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Chen-Hau Wu0
Ching-Yu Chang0
Date of Patent
June 3, 2014
0Patent Application Number
134426870
Date Filed
April 9, 2012
0Patent Citations Received
Patent Primary Examiner
Patent abstract
The present disclosure provides a sensitive material. The sensitive material includes a polymer that turns soluble to a base solution in response to reaction with acid; a plurality of photo-base generators (PBGs) that decompose to form base in response to radiation energy; and a thermal sensitive component that generates acid in response to thermal energy.
Timeline
No Timeline data yet.
Further Resources
No Further Resources data yet.
