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US Patent 8742509 Apparatus and method for FinFETs

Overview Structured Data Issues Contributors Activity

Is a

Date Filed

March 1, 2012

Date of Patent

June 3, 2014

Patent Application Number

13410073

Patent Citations Received

US Patent 12132111 Formation method of semiconductor device structure with gate stacks

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US Patent 11699758 Isolation structure having different distances to adjacent FinFET devices

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US Patent 11749720 Integrated circuit structure and method with solid phase diffusion

US Patent 11749682 Selective dual silicide formation using a maskless fabrication process flow

US Patent 11855151 Multi-gate device and method of fabrication thereof

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Patent Inventor Names

Cheng-Hsien Wu

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Chih-Hsin Ko

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Yi-Jing Lee

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You-Ru Lin

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Cheng-Tien Wan

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Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

Patent Primary Examiner

Fernando L Toledo

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