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US Patent 8779600 Interlevel dielectric stack for interconnect structures
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Patent
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Date Filed
January 5, 2012
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Date of Patent
July 15, 2014
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Patent Application Number
13344009
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Patent Citations Received
US Patent 11942426 Semiconductor structure having alternating selective metal and dielectric layers
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US Patent 11791398 Nano multilayer carbon-rich low-k spacer
Patent Inventor Names
Thomas J. Haigh, Jr.
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Alfred Grill
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Griselda Bonilla
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Satyanarayana V. Nitta
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Son Van Nguyen
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Patent Jurisdiction
United States Patent and Trademark Office
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Patent Number
8779600
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Patent Primary Examiner
Elias M Ullah
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