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US Patent 8883405 Method for forming pattern

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Patent Citations Received
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US Patent 12125711 Reducing roughness of extreme ultraviolet lithography resists
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US Patent 12105422 Photoresist development with halide chemistries
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US Patent 11988965 Underlayer for photoresist adhesion and dose reduction
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US Patent 11921427 Methods for making hard masks useful in next-generation lithography
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Patent Inventor Names
Eishi Shiobara0
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Official Website
https://pdfpiw.uspto.gov/.piw?Docid=08883405
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US Patent 08883405 Method for forming pattern US Patent 8883405 Method for forming pattern

Infobox
Patent Number
08883405
Patent Number
8883405
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Website URL
https://pdfpiw.uspto.gov/.piw?Docid=08883405
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 US Patent 08883405 Method for forming pattern

Infobox
Is a
Patent
Patent
Patent jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent number
08883405
Date of patent
November 11, 2014
Patent application number
13595244
Date Filed
August 27, 2012
Patent primary examiner
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Kathleen Duda

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