Is a
Patent attributes
Patent Jurisdiction
Patent Number
Patent Inventor Names
Masayoshi Sagehashi0
Jun Hatakeyama0
Date of Patent
April 28, 2015
Patent Application Number
14022287
Date Filed
September 10, 2013
Patent Citations Received
Patent Primary Examiner
Patent abstract
A chemically amplified resist composition comprising a base polymer and an amine quencher in the form of a β-alanine, γ-aminobutyric acid, 5-aminovaleric acid, 6-aminocaproic acid, 7-aminoheptanoic acid. 8-aminooctanoic acid or 9-aminononanoic acid derivative having an unsubstituted carboxyl group has a high contrast of alkaline dissolution in rate before and after exposure and forms a pattern of good profile at a high resolution, minimal roughness and wide DOF.
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