US Patent 9017922 Chemically amplified resist composition and patterning process
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Patent abstract
A chemically amplified resist composition comprising a base polymer and an amine quencher in the form of a β-alanine, γ-aminobutyric acid, 5-aminovaleric acid, 6-aminocaproic acid, 7-aminoheptanoic acid. 8-aminooctanoic acid or 9-aminononanoic acid derivative having an unsubstituted carboxyl group has a high contrast of alkaline dissolution in rate before and after exposure and forms a pattern of good profile at a high resolution, minimal roughness and wide DOF.
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Patent Inventor Names
Jun Hatakeyama0
Masayoshi Sagehashi0
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Patent Citations Received
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US Patent 09017922 Chemically amplified resist composition and patterning process US Patent 9017922 Chemically amplified resist composition and patterning process
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Patent Number
09017922
Patent Number
9017922
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Official Website
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US Patent 09017922 Chemically amplified resist composition and patterning process
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Is a
Patent jurisdiction
Patent number
09017922
Date of patent
April 28, 2015
Patent application number
14022287
Date Filed
September 10, 2013
Patent primary examiner
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