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US Patent 9134633 System and method for dark field inspection
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Patent
Date Filed
December 23, 2013
Date of Patent
September 15, 2015
Patent Application Number
14138743
Patent Citations Received
US Patent 12133319 Apparatus and method for generating extreme ultraviolet radiation
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US Patent 12087579 Method for forming semiconductor device
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US Patent 12085867 Lithography process monitoring method
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US Patent 12119273 System and method for high speed inspection of semiconductor substrates
0
US Patent 11749571 System and method for high speed inspection of semiconductor substrates
US Patent 11756789 Semiconductor manufacturing method and apparatus thereof
US Patent 11762302 Integrated circuit overlay test patterns and method thereof
US Patent 11782352 Lithography process monitoring method
US Patent 11852590 Systems and methods for metrology with layer-specific illumination spectra
0
Patent Jurisdiction
United States Patent and Trademark Office
Patent Number
9134633
Patent Primary Examiner
Christopher Young
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