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US Patent 9147029 Stretch dummy cell insertion in FinFET process

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Patent attributes

Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
91470290
Date of Patent
September 29, 2015
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Patent Application Number
143258680
Date Filed
July 8, 2014
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Patent Citations Received
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US Patent 11842131 Method and system for generating layout diagram for semiconductor device having engineering change order (ECO) cells
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US Patent 11935833 Method of forming power grid structures
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US Patent 11714947 Method and layout of an integrated circuit
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Patent Primary Examiner
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Mohammed Alam
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Patent abstract

A method embodiment includes identifying, by a processor, an empty region in an integrated circuit (IC) layout, wherein the empty region is a region not including any active fins. The method further includes providing a standard dummy fin cell and forming an expanded dummy fin cell. The standard dummy fin cell includes a plurality of partitions. The expanded dummy fin cell is larger than the standard dummy fin cell, and the expanded dummy fin cell includes integer multiples of each of the plurality of partitions. The empty region is filled with a plurality of dummy fin cells, wherein the plurality of dummy fin cells includes the expanded dummy fin cell. The plurality of dummy fin cells is implemented in an IC.

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