Is a
Patent attributes
Patent Jurisdiction
Patent Number
Date of Patent
October 6, 2015
Patent Application Number
14081345
Date Filed
November 15, 2013
Patent Citations Received
...
Patent Primary Examiner
Patent abstract
A method of forming a target pattern includes forming a first material layer on a substrate; performing a first patterning process using a first layout to form a first plurality of trenches in the first material layer; performing a second patterning process using a second layout to form a second plurality of trenches in the first material layer; forming spacer features on sidewalls of both the first plurality of trenches and the second plurality of trenches, the spacer features having a thickness; removing the first material layer; etching the substrate using the spacer features as an etch mask; and thereafter removing the spacer features. The target pattern is to be formed with the first layout and the second layout.
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