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US Patent 9176379 Resist composition and method for producing resist pattern

Patent 9176379 was granted and assigned to Sumitomo Chemical on November, 2015 by the United States Patent and Trademark Office.

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Patent abstract

A resist composition includes (A) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, (B) an acid generator having a structure to be cleaved by the action of an alkaline developer, and (C) a compound represented by the formula (I),

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