Patent 9176379 was granted and assigned to Sumitomo Chemical on November, 2015 by the United States Patent and Trademark Office.
A resist composition includes (A) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, (B) an acid generator having a structure to be cleaved by the action of an alkaline developer, and (C) a compound represented by the formula (I),