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US Patent 11774853 Resist composition and patterning process

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Patent attributes

Patent Jurisdiction

United States Patent and Trademark Office

Patent Number

Patent Inventor Names

Kazuhiro Katayama

Masahiro Fukushima

Masaki Ohashi

Jun Hatakeyama

Takayuki Fujiwara

Date of Patent

October 3, 2023

Patent Application Number

16717292

Date Filed

December 17, 2019

Patent Citations

US Patent 9563123 Photoresist composition, compound and process of producing photoresist pattern

US Patent 9448475 Photoresist composition, compound and process of producing photoresist pattern

US Patent 10295904 Resist composition and patterning process

US Patent 9122153 Cyclic compound, method for producing same, composition, and method for forming resist pattern

US Patent 9176379 Resist composition and method for producing resist pattern

Patent Primary Examiner

CPC Code

Patent abstract

A resist composition comprising an iodized base polymer and an iodized benzene ring-containing quencher has a high sensitivity and improved LWR and CDU.

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