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US Patent 11774853 Resist composition and patterning process

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
Date Filed
December 17, 2019
Date of Patent
October 3, 2023
Patent Application Number
16717292
Patent Citations
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US Patent 9563123 Photoresist composition, compound and process of producing photoresist pattern
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US Patent 9448475 Photoresist composition, compound and process of producing photoresist pattern
‌
US Patent 10295904 Resist composition and patterning process
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US Patent 9122153 Cyclic compound, method for producing same, composition, and method for forming resist pattern
‌
US Patent 9176379 Resist composition and method for producing resist pattern
Patent Inventor Names
Kazuhiro Katayama
Masahiro Fukushima
Masaki Ohashi
Jun Hatakeyama
Takayuki Fujiwara
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
11774853
Patent Primary Examiner
Duane Smith
Duane Smith
CPC Code
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G03F 7/0395
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G03F 7/0397
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G03F 7/0392
‌
G03F 7/039
‌
G03F 7/0382
‌
G03F 7/038
‌
G03F 7/0046
‌
G03F 7/0045

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