US Patent 11774853 Resist composition and patterning process
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US Patent 11774853 Resist composition and patterning process
Article
Patent abstract
A resist composition comprising an iodized base polymer and an iodized benzene ring-containing quencher has a high sensitivity and improved LWR and CDU.
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Patent Jurisdiction
Patent Number
Patent Inventor Names
Jun Hatakeyama
Kazuhiro Katayama
Masahiro Fukushima
Masaki Ohashi
Takayuki Fujiwara
Date of Patent
October 3, 2023
Patent Application Number
16717292
Date Filed
December 17, 2019
Patent Citations
Patent Primary Examiner
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