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US Patent 9287113 Methods for depositing films on sensitive substrates

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
Date Filed
November 7, 2013
Date of Patent
March 15, 2016
Patent Application Number
14074617
Patent Citations Received
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US Patent 12112980 Method to create air gaps
0
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US Patent 11987876 Chamfer-less via integration scheme
0
‌
US Patent 12094711 Tin oxide films in semiconductor device manufacturing
0
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US Patent 11658008 Film forming apparatus and film forming method
0
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US Patent 11776807 Plasma enhanced deposition processes for controlled formation of oxygen containing thin films
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US Patent 11784047 Tin oxide thin film spacers in semiconductor device manufacturing
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US Patent 11784043 Formation of SiN thin films
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
9287113
Patent Primary Examiner
‌
Thanhha Pham

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