Is a
Patent attributes
Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
Patent Inventor Names
Samantha S. H. Tan0
Yang Pan0
Hui-Jung Wu0
Boris Volosskiy0
Nader Shamma0
Richard Wise0
Yu Jiang0
Jengyi Yu0
Date of Patent
September 17, 2024
0Patent Application Number
176505510
Date Filed
February 10, 2022
0Patent Citations
...
Patent Primary Examiner
Patent abstract
Tin oxide film on a semiconductor substrate is etched selectively with an etch selectivity of at least 10 in a presence of silicon (Si), carbon (C), or a carbon-containing material (e.g., photoresist) by exposing the substrate to a process gas comprising hydrogen (H
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