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US Patent 9436990 Defect observation method and device therefor

Patent 9436990 was granted and assigned to Hitachi on September, 2016 by the United States Patent and Trademark Office.

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Patent
Patent

Patent attributes

Patent Applicant
Hitachi
Hitachi
Current Assignee
Hitachi
Hitachi
Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
Patent Number
9436990
Date of Patent
September 6, 2016
Patent Application Number
14367186
Date Filed
October 22, 2012
Patent Citations Received
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US Patent 11976263 Cell culture insert
0
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US Patent 11790513 Defect inspection apparatus and defect inspection method
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US Patent 11912968 Microcavity dishes with sidewall including liquid medium delivery surface
0
Patent Primary Examiner
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Brian P. Werner
Patent abstract

The present invention is detection of a defect signal which is small enough to be buried in a background noise, by a method that includes detecting a defect on a specimen which is detected by another inspection device by using a detection device equipped with an optical microscope, amending positional information of the defect, observing the defect by using an SEM, wherein the detecting the defect is carried out such that forming stationary waves on the specimen by irradiating the specimen with two illumination lights having the same wavelength from the opposite directions on the same incidence plane at the same incidence angle and cause the two illuminating light to interfere; removing scattered components generated by minute irregularities on the specimen surface by a spatial filter, detecting an image formed by the scattered light not removed by the spatial filter; and processing the detected image to detect the defect.

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