US Patent 9484191 Pulsed remote plasma method and system
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Patent abstract
A system and method for providing pulsed excited species from a remote plasma unit to a reaction chamber are disclosed. The system includes a pressure control device to control a pressure at the remote plasma unit as reactive species from the remote plasma unit are pulsed to the reaction chamber.
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Patent Inventor Names
Jereld Lee Winkler0
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US Patent 09484191 Pulsed remote plasma method and system US Patent 9484191 Pulsed remote plasma method and system
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Patent Number
094841910
Patent Number
94841910
Edits on 24 Sep, 2022
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Patent Jurisdiction
Patent Number
094841910
Date of Patent
November 1, 2016
0Patent Application Number
137913390
Date Filed
March 8, 2013
0Official Website
Patent Primary Examiner
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US Patent 09484191 Pulsed remote plasma method and system
Infobox
Is a
Patent jurisdiction
Patent number
09484191
Date of patent
November 1, 2016
Patent application number
13791339
Date Filed
March 8, 2013
Patent primary examiner
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