US Patent 9567672 Deposition apparatus and cleansing method using the same
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Patent abstract
Provided is a deposition apparatus including a connection channel connecting a gas inflow channel and a gas outflow channel so as to increase cleaning efficiency by providing a portion of cleaning gas to the dead space of the gas inflow channel and controlling a flow of a cleaning gas.
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US Patent 09567672 Deposition apparatus and cleansing method using the same US Patent 9567672 Deposition apparatus and cleansing method using the same
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Patent Number
0956767200
Patent Number
956767200
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Is a
Patent Jurisdiction
Patent Number
095676720
Date of Patent
February 14, 2017
0Patent Application Number
148345050
Date Filed
August 25, 2015
0Official Website
Patent Primary Examiner
Edits on 5 Oct, 2022
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Infobox
Is a
Patent Jurisdiction
Patent Number
095676720
Date of Patent
February 14, 2017
0Patent Application Number
148345050
Date Filed
August 25, 2015
0Official Website
Patent Primary Examiner
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US Patent 09567672 Deposition apparatus and cleansing method using the same
Infobox
Is a
Patent jurisdiction
Patent number
09567672
Date of patent
February 14, 2017
Patent application number
14834505
Date Filed
August 25, 2015
Patent primary examiner
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