US Patent 9640366 Electron beam irradiation method and scanning electron microscope
Patent 9640366 was granted and assigned to Hitachi on May, 2017 by the United States Patent and Trademark Office.
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Patent abstract
The present invention has for its object to provide a charged particle beam irradiation method and a charged particle beam apparatus which can suppress unevenness of electrification even when a plurality of different kinds of materials are contained in a pre-dosing area or degrees of density of patterns inside the pre-dosing area differs with positions.
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Patent Inventor Names
Hideyuki Kazumi0
Kazutami Tago0
Minoru Yamazaki0
Toshiyuki Yokosuka0
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US Patent 09640366 Electron beam irradiation method and scanning electron microscope US Patent 9640366 Electron beam irradiation method and scanning electron microscope
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Patent Number
096403660
Patent Number
96403660
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Is a
Current Assignee
Patent Jurisdiction
Patent Number
096403660
Date of Patent
May 2, 2017
0Patent Application Number
135802880
Date Filed
February 9, 2011
0Official Website
Patent Primary Examiner
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US Patent 09640366 Electron beam irradiation method and scanning electron microscope
Infobox
Is a
Current assignee
Patent jurisdiction
Patent number
09640366
Date of patent
May 2, 2017
Patent application number
13580288
Date Filed
February 9, 2011
Patent primary examiner
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