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US Patent 9640367 Plasma source for a focused ion beam system

Patent 9640367 was granted and assigned to FEI Company on May, 2017 by the United States Patent and Trademark Office.

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Patent abstract

The present invention provides an inductively coupled, magnetically enhanced ion beam source, suitable to be used in conjunction with probe-forming optics to produce an ion beam without kinetic energy oscillations induced by the source.

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