US Patent 9640367 Plasma source for a focused ion beam system
Patent 9640367 was granted and assigned to FEI Company on May, 2017 by the United States Patent and Trademark Office.
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Patent abstract
The present invention provides an inductively coupled, magnetically enhanced ion beam source, suitable to be used in conjunction with probe-forming optics to produce an ion beam without kinetic energy oscillations induced by the source.
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Patent Inventor Names
Christine Charles0
John Keller0
Lawrence Scipioni0
Noel Smith0
Orson Sutherland0
Roderick Boswell0
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US Patent 09640367 Plasma source for a focused ion beam system US Patent 9640367 Plasma source for a focused ion beam system
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Patent Number
096403670
Patent Number
96403670
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Official Website
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Patent Applicant
Current Assignee
Patent Jurisdiction
Patent Number
096403670
Date of Patent
May 2, 2017
0Patent Application Number
144816420
Date Filed
September 9, 2014
0Official Website
Patent Primary Examiner
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US Patent 09640367 Plasma source for a focused ion beam system
Infobox
Is a
Patent applicant
Current assignee
Patent jurisdiction
Patent number
09640367
Date of patent
May 2, 2017
Patent application number
14481642
Date Filed
September 9, 2014
Patent primary examiner
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