US Patent 9709905 System and method for dark field inspection
All edits
Edits on 27 Dec, 2023
Golden AI
Edits made to:
Infobox (+1 properties)
Infobox
Patent Citations Received
Edits on 6 Dec, 2023
Golden AI
Edits made to:
Article (+418 characters)
Article
Patent abstract
A method for fabricating a semiconductor structure includes providing a substrate and a first layer over the substrate, wherein the first layer includes one or more overlay marks. The method further includes forming one or more layers on the first layer and performing a dark field (DF) inspection on the one or more overlay marks underlying the one or more layers to receive a post-film-formation data.
Edits on 30 Sep, 2023
Golden AI
Edits made to:
Infobox (+4 properties)
Infobox
Patent Inventor Names
Bo-Jiun Lin0
Hai-Ching Chen0
Hsin-Chieh Yao0
Tien-I Bao0
Edits on 13 Jul, 2023
Golden AI
Edits made to:
Infobox (+1/-1 properties)
US Patent 09709905 System and method for dark field inspection US Patent 9709905 System and method for dark field inspection
Infobox
Patent Number
097099050
Patent Number
97099050
Edits on 26 May, 2023
Golden AI
Edits made to:
Infobox (-1 properties)
Infobox
Official Website
Edits on 22 Mar, 2023
Golden AI
Infobox
Is a
Patent Jurisdiction
Patent Number
097099050
Date of Patent
July 18, 2017
0Patent Application Number
148505320
Date Filed
September 10, 2015
0Official Website
Patent Primary Examiner
Edits on 15 Jun, 2022
Golden AI
Edits made to:
Infobox (+1 properties)
Infobox
Website URL
Edits on 13 Jan, 2022
Golden AI
Edits made to:
Infobox (+7 properties)
US Patent 09709905 System and method for dark field inspection
Infobox
Is a
Patent jurisdiction
Patent number
09709905
Date of patent
July 18, 2017
Patent application number
14850532
Date Filed
September 10, 2015
Patent primary examiner
Find more entities like US Patent 9709905 System and method for dark field inspection
Use the Golden Query Tool to find similar entities by any field in the Knowledge Graph, including industry, location, and more.
