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US Patent 9869939 Lithography process

OverviewStructured DataIssuesContributorsActivity
Is a
Patent
Patent
0
Date Filed
June 8, 2015
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Date of Patent
January 16, 2018
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Patent Application Number
14733719
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Patent Citations Received
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US Patent 12135499 Reticle enclosure for lithography systems
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US Patent 12085866 Particle removing assembly and method of cleaning mask for lithography
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US Patent 12114411 Apparatus and method for generating extreme ultraviolet radiation
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US Patent 12114412 Shock wave visualization for extreme ultraviolet plasma optimization
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US Patent 12119129 EUV lithography apparatus
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US Patent 12117725 Pellicle for an EUV lithography mask and a method of manufacturing thereof
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US Patent 11680958 Particle image velocimetry of extreme ultraviolet lithography systems
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US Patent 11698592 Particle removing assembly and method of cleaning mask for lithography
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US Patent 11714350 Method of fabricating and servicing a photomask
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US Patent 11747735 EUV vessel perimeter flow auto adjustment
•••
Patent Inventor Names
Anthony Yen
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Shinn-Sheng Yu
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Patent Jurisdiction
United States Patent and Trademark Office
United States Patent and Trademark Office
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Patent Number
9869939
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Patent Primary Examiner
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Paul Dinh
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