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US Patent D876504 Exhaust flow control ring for semiconductor deposition apparatus

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Is a

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Patent attributes

Patent Jurisdiction

United States Patent and Trademark Office

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Patent Number

Patent Inventor Names

Dong Rak Jung0

Seung Wook Kim0

Sung Hoon Jun0

Julll Lee0

Date of Patent

February 25, 2020

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Patent Application Number

296041010

Date Filed

May 15, 2017

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Patent Citations

US Patent 10121671 Methods of depositing metal films using metal oxyhalide precursors

US Patent 10147600 Methods for forming doped silicon oxide thin films

US Patent 10177025 Method and apparatus for filling a gap

US Patent 10018920 Lithography patterning with a gas phase resist

US Patent 10047435 Dual selective deposition

US Patent 10106892 Thermal oxide equivalent low temperature ALD oxide for dual purpose gate oxide and method for producing the same

US Patent 10283353 Method of reforming insulating film deposited on substrate with recess pattern

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US Patent 10290508 Method for forming vertical spacers for spacer-defined patterning

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Patent Citations Received

US Patent D1040304 Deposition ring for physical vapor deposition chamber

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US Patent D1013841 Retaining ring

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US Patent D992615 Focus ring

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Patent Primary Examiner

Patricia A Palasik

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