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US Patent 10032890 Method of manufacturing semiconductor devices
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Patent
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Date Filed
November 28, 2016
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Date of Patent
July 24, 2018
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Patent Application Number
15361516
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Patent Citations Received
US Patent 11349007 Semiconductor device
US Patent 11552178 Metal gate structures for field effect transistors
US Patent 10777679 Removal of work function metal wing to improve device yield in vertical FETs
Patent Inventor Names
Yeon-Tack Ryu
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Joo-Cheol Han
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Jun-Hwan Yim
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No-Ul Kim
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Bo-Un Yoon
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Ho-Young Kim
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Ja-Eung Koo
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Patent Jurisdiction
United States Patent and Trademark Office
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Patent Number
10032890
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Patent Primary Examiner
Bradley K. Smith
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