Create
Log in
Sign up
Golden has been acquired by ComplyAdvantage.
Read about it here ⟶
US Patent 10109490 Cobalt interconnects formed by selective bottom-up fill
Overview
Structured Data
Issues
Contributors
Activity
Access by API
Access by API
Is a
Patent
0
Date Filed
June 20, 2017
0
Date of Patent
October 23, 2018
0
Patent Application Number
15627879
0
Patent Citations Received
US Patent 12131948 Techniques for void-free material depositions
0
US Patent 10903316 Radio frequency switches with air gap structures
US Patent 10923577 Cavity structures under shallow trench isolation regions
US Patent 11749564 Techniques for void-free material depositions
US Patent 11410872 Oxidized cavity structures within and under semiconductor devices
Patent Inventor Names
Sean X. Lin
0
Xunyuan Zhang
0
Patent Jurisdiction
United States Patent and Trademark Office
0
Patent Number
10109490
0
Patent Primary Examiner
Chuong A Luu
0
Find more entities like US Patent 10109490 Cobalt interconnects formed by selective bottom-up fill
Use the Golden Query Tool to find similar entities by any field in the Knowledge Graph, including industry, location, and more.
Open Query Tool
Access by API
Company
Home
Press & Media
Blog
Careers
WE'RE HIRING
Products
Knowledge Graph
Query Tool
Data Requests
Knowledge Storage
API
Pricing
Enterprise
ChatGPT Plugin
Legal
Terms of Service
Enterprise Terms of Service
Privacy Policy
Help
Help center
API Documentation
Contact Us
SUBSCRIBE