US Patent 10221131 Acid generator compounds and photoresists comprising same
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Patent abstract
Acid generator compounds are provided that are particularly useful as a photoresist composition component. In one preferred aspect, acid generators are provided that comprise one or more hydrophilic moieties.
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Patent Inventor Names
Cheng-Bai Xu0
Cong Liu0
Irvinder Kaur0
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Patent Jurisdiction
Patent Number
102211310
Date of Patent
March 5, 2019
0Patent Application Number
151672230
Date Filed
May 27, 2016
0Patent Citations Received
Patent Primary Examiner
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US Patent 10221131 Acid generator compounds and photoresists comprising same
Infobox
Is a
Patent jurisdiction
Patent number
10221131
Date of patent
March 5, 2019
Patent application number
15167223
Date Filed
May 27, 2016
Patent primary examiner
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